HOME/Specifications
PRECISION, MADE FOR YOU.

Product
Specification

Check the photomask specifications that fit your application.

01 / GENERAL·BINARY MASK

General·Binary Mask

Production process

Specification

General·Binary Mask · Specification (unit: ㎛)
ItemS+SA+ABC
Min. CD (L&S)0.80.91.0———
Min. CD———2510
CD Tolerance±0.03±0.08±0.1±0.2±0.5±1.0
CD Range≤0.04≤0.10≤0.13———
CD Uniformity———≤0.3≤0.8≤1.5
Registration±0.035±0.05±0.1———
Total Pitch———±1.0 ~ ±5
Defect size<0.2<0.3<0.5<1.0<2.0<4.0
SubstrateQuartzQuartz & Sodalime
Material size5″, 6″5″, 6″, 7″, 9″126.6 × 126.6 mm ~ 1400 × 1400 mm
Thickness2.3T / 6.35T2.3T / 3.0T / 3.8T / 6.35T1.0T / 1.5T / 2.3T / 3.0T / 4.8T / 5.0T / 6.35T / 8T / 10T

Supported Sizes

Size and thickness in mm · Dots indicate supported options in the supplied reference.
CategorySize (mm)2.33.04.86.357.8SODAQUARTZCHROME
SMALL126.6 × 126.6SupportedNot listed in referenceNot listed in referenceNot listed in referenceNot listed in referenceSupportedSupportedSupported
152.0 × 152.0SupportedNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupportedSupportedSupported
177.4 × 177.4SupportedSupportedNot listed in referenceNot listed in referenceNot listed in referenceSupportedSupportedSupported
LARGE228.6 × 228.6Not listed in referenceSupportedSupportedNot listed in referenceNot listed in referenceSupportedSupportedSupported
350.0 × 350.0Not listed in referenceSupportedNot listed in referenceNot listed in referenceNot listed in referenceSupportedSupportedSupported
355.6 × 355.6Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedSupportedSupported
355.6 × 431.8SupportedSupportedNot listed in referenceNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupported
406.4 × 533.4Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupported
508.0 × 609.6Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedSupportedSupported
609.6 × 609.6Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupported
609.6 × 711.2Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedSupportedSupported
620.0 × 720.0Not listed in referenceNot listed in referenceNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupportedSupported
700.0 × 800.0Not listed in referenceNot listed in referenceSupportedNot listed in referenceSupportedSupportedSupportedSupported
800.0 × 920.0Not listed in referenceNot listed in referenceSupportedNot listed in referenceSupportedNot listed in referenceSupportedSupported
914.4 × 1,117.6Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupported
813.0 × 1,379.0Not listed in referenceNot listed in referenceSupportedNot listed in referenceNot listed in referenceSupportedNot listed in referenceSupported

Listed options follow the supplied reference. Confirm the final substrate, thickness, and film conditions during consultation.

02 / IC MASK

IC Mask

Production process

Specification

IC Mask specifications by grade (unit: ㎛)
ItemABCDEFGH
Design Rule≥2.51.510.80.50.350.250.18
CD Tolerance±1.00±0.50±0.20±0.10±0.07±0.05±0.04±0.03
CD Uniformity≤1≤0.5≤0.2≤0.1≤0.07≤0.05≤0.04≤0.03
CD MTT±1±0.5±0.2±0.1±0.07±0.05±0.04±0.03
Registration±2.0±1.0±0.5±0.2±0.1±0.07±0.05±0.035
Defect size<4<3<2<1<0.5<0.5<0.3<0.2

Supported Sizes

152.0 × 152.0 mm · 6.35T · Quartz only.
Size (mm)6.35QUARTZ
152.0 × 152.0SupportedSupported
03 / SPECIAL MASKS

Special Masks

Custom photomasks with patterns and functions designed and manufactured for development and mass-production purposes.

01 / MULTI-TONE

Multi-Tone Mask

A mask that implements areas of different transmittance on a single mask to evaluate the sensitivity characteristics of lithography photosensitive materials such as PR and resin.

Diagram showing the transmittance patterns of a multi-tone mask and the relationship between light, exposure, and result
Multi-tone mask with different transmittance by area, and the exposure concept
Posi Type example.
Min. CD
Line & Space: 2μm ±0.2μm
Transmittance tolerance
±3%
Layer-to-layer overlay
±2μm
Wavelength range
350–700nm · reference wavelength selectable
Size
126.6 × 126.6 / 152.0 × 152.0 / 177.4 × 177.4mm
Thickness
4.8 / 6.35 / 7.8mm
02 / TARGET

Target Mask

A chart mask that achieves lower reflectance than standard products. It is used for vision calibration charts, machine calibration charts, and test targets.

Reflectance standard
Chrome / white glass · 3.0% or more at 430nm
Applications
Vision and equipment calibration, test targets
Specification adjustment
Negotiable depending on the purpose of use

Detailed specifications and production conditions for each product may vary by application.

We will find the precision you need, together.