마이크로이미지 포토마스크 Photo mask - Blank Mask
마이크로이미지
Blank Mask
Glass Mask Structure
GLASS MASK STRUCTURE



Properties Type Soda lime Quartz
Chemical
Composition
SiO2 70 ~ 72% 100%
Na2O + K2O 13 ~ 15%
Al2O2 1.5 ~ 2.2%
CaO 8 ~ 12%
MgO 1.5 ~ 4%
Fe2O2 0.07 ~ 0.15%
Heat
Properties
Coefficient of Thermal Exparsion (50-200) 81~94×10-7 / (℃) 6.5×10-7 / (℃)
Softening Point(℃) 740 1,683
Annealing Point(Transformation Temp)(℃) 562 1,215
Strain Point(℃) 511 1,120
Optical
Properties
Light Transmittance (%) t=2.3㎜, wavetength=400㎜ 90 90 90 90/200
Refraction Index nD 1.52 1.46
Chemical
Properties
Water resistance JIS R-3502 0.35
Acid resistance (㎎/㎠) 0.002 0.000
Alkaline resistance (㎎/㎠) 0.042 0.032
Mechanical
Properties
Specific gravity 2.49 2.20
Young’s modulus (㎏/㎟) 7,300 745,000
Rigidility (㎏/㎟) 3,020 32,000
Knoop Hardness nu- (㎏/㎟) 540 650
Electrical
Properties
Cubical resistance at 200℃ 7.7 12.5
Dielectric 7.5 4.0



GLASS의 열팽창 비교, GLASS의 투과율 특성 비교(t:10mm)