Pellicle Mount
What is a Pellicle
It is a thin film which protects the surface of the Photo Mask from contamination by particles in the air.
Purpose of Using Pellicle
- It txtends the washing cycle of the Photo Mask - Protects the Photo Mask from contamination
- Separates the Photo Mask from contaminants during repeated use.
- Extends the life of the Photo Mask
Comparison of Pellicle
| Category | Cellulose | Per-Fluorop olymer |
|---|---|---|
| Applicable Wavelength Range of Light Exposure | G & I Line | |
| Transmittance | over 99 % at G&I Line | |
| Life Time | 200,000 Joule/cm at i-line light source | 1,000,000 Joule/cm at i-line light source |
| Exposure Frequency based on Shut | 200,000,000mj/cm ÷ 600mj/cm = 333,333Shut |
1,000,000,000mj/cm ÷ 600mj/cm = 1,666,666Shut |
※ No Problems in the pattern on the wafer even when coming into contact with particles on the FILM side of the Pellicle
