History
2000
Company name changed to MICRO IMAGE Co., LTD.- Cheongwon Factory completed
1999
- Establishment of CAD Division / PHOTOMASK Division / R&D
1992
- Founding of IMAGE ENG
- Manufacture of FILM MASK using LASER
2009
- Selected as venture company (Korea Technology Credit Guarantee Fund)
- Investment in Taiwan FORMOSA
2007
- Acquisition of ISO14001 Certification Expansion of CLEAN 100CLASS
- Expansion of CLEAN 100CLASS
2006
- Participation in SEDEX KOREA 2006
- Receipt of Appreciation Plaque (Samsung Electronics Daejeon Establishment)
- Acquisition of Development/Etching related patents
2004
- Selected by the Small and Medium Business Administration as an INNO-BIZ firm
2003
- Small and medium Business Corporation – Received Outstanding SME Award
- Korea Technology Credit Guarantee Fund – Selected as blue-chip technology firm
- For SMEs – Citation from the Minister of Commerce, Industry and Energy
2002
- SAcquisition of ISO9001:2000 Certification
- Registration as a venture company
- Selection of STEMCO.,LTD as an excellent cooperative firm
2001
- Start of PHOTO MASK Mass production
- Registration of utility model, Obtained Certification from I Company (FLIP CHIP related)
2015
- Start of PHOTO MASK Coating Service